Campus Create Co, Ltd will hold the 4th Science Salon on March 22,23 2023,
titled “Next Generation Green Power Technology”,
to introduce the latest research in new semiconductor materials, oxide semiconductors,
new power device MOSFETs,and related technologies.
We are waiting for your participation.
【Date・Time】
March 22-23 10:00～17:30(Japan Time)
Online seminar via ZOOM
Free to register
https://forms.gle/Jf2gvMG8mw9ofbGG9
March 22 Session 1 10:00-17:30
10:00-10:10 Opening Remarks from Organizer Campus Create Co., Ltd
10:10-11:00 Keynote:Issues in Oxide Semiconductors
Prof.Hideo Hosono,Tokyo Institute of Technology
11:00-11:45 Gate Stack Formation Technology for Next Generation Power MOSFETs
Prof.Koji Kita,The University of Tokyo
11:45-12:30 High temperature resistant packaging technology for SiC power devices
Prof.Kohei Tatsumi,Waseda University
14:00-14:45 Present Status of Diamond Power Semiconductors
Prof.Makoto Kasu,Saga University
14:45-15:30 Physics of SiC MOS interface
Prof.Tetsuo Hatakeyama,Toyama Prefectural University
16:00-16:45 Crystal innovation driving the semiconductor industry
Prof.Yusuke MORI,Osaka University
16:45-17:30 Improvement of SiC device reliability by proton implantation
Assoc.Prof.Masashi Kato,Nagoya Institute of Technology
March 22 Session 2 10:00-17:30
(※Session 1,2 will be hold simultaneously by separated ZOOM webinars)
11:00-11:45 Developments of GaN-based blue Vertical-Cavity Surface-Emitting Lasers
Prof.Tetsuya Takeuchi,Meijo University
11:45-12:30 Short pulse mode-locked fiber laser with self-starting function
Assoc.Prof.Tatsutoshi Shioda,Saitama University
14:00-14:45 High speed liquid-crystals towards laser TV and projector and other LC technologies
Prof.Kohki Takatoh,Tokyo University of Science, Yamaguchi
14:45-15:30 Applied product development by hologram technology fusion
Prof. Hideyoshi Horimai,Fujian Normal University
15:30-16:45 Break
16:45-17:30 Improvement of SiC device reliability by proton implantation
Prof.Munehiro Kimura,Nagaoka University of Technology
March 23 Session 3 10:00-17:30
10:00-10:45 HZO-based ferroelectric devices for lower-power memory applications
Prof.Shinichi Takagi,The University of Tokyo
10:45-11:30 Active THz Metamaterials Based on Microelectromechanical systems
Prof.Yoshiaki Kanamori,Tohoku University
11:30-12:15 Advanced simulation technology for next generation CMP
Prof.Norikazu Suzuki,Chuo University
14:00-14:45 Next generation power module and unit technology using WBG devices
Prof.Yoshikazu Takahashi,Tohoku University
14:45-15:30 Current status and future prospects of oxide TFTs
Prof.Mamoru Furuta,Kochi University of Technology
16:00-16:45 Degradation Phenomenon and Reliability Improvement Technology of Metal Oxide Thin Film Transistors
Prof.Yukiharu Uraoka,Nara Institute of Science and Technology
16:45-17:30 Applications of the surface activated bonding on heterogeneous Integration at room temperature
Prof.Tadatomo Suga,Meisei University
